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1. High film quality: PVD technology is performed at low temperatures, reducing the thermal stress and oxidation risk of the substrate material, resulting in high density and flatness of the film

2. Accurate film thickness: PVD technology can control the deposition time and rate to achieve precise control of film thickness, ensuring consistent performance of the entire bipolar plate surface.

3. Improving electrochemical performance: PVD coating materials have excellent electrochemical performance and can enhance the electrochemical performance of metal bipolar plates.

4. Application of Strength Source Products in the Preparation of PVD Coatings on Metal Bipolar Plates